Macchina per deposito di film sottili

Beneq Thin Film System TFS 500 ALD reactor is designed for thin film processing, protective coating, functional surface buildup and doping purposes. Substrate alternatives include wafers and other planar substrates, powders and porous substrates and complex 3D substrates. Beneq TFS 500 can be equipped with a manual load lock for rapid wafer processing. Reactor operates in batch mode. Variable reaction chambers can be fitted to the reactor making it possible to optimize the reaction chamber design depending on the application.
Flexibility of Beneq TFS 500 ALD reactor:

• Modular construction
• Several reaction chamber types available – easy to change
• Suitable sources for all precursors
• Easy upgrading and later modifications
• Fully configurable recipes

Innovative and unique design of Beneq TFS 500 ALD reactor:

• Large reaction space with small foot print
• Compact source constructions
• All daily operations above waistline
• No out-hanging components
• All chemicals in ventilated hood
• Over-pressure safe vacuum chamber construction
• Easy access for maintenance
• Good visibility to all connections
• All cover sheets easy to open
• Hinged back flange with heaters on sliding rails